Lurie Nanofabrication Facility

MEMS/NEMS and microfluidic systems

The 13,500 sq. ft. Lurie Nanofabrication Facility (LNF), of the University of Michigan, offers complete capabilities for fabrication, simulation, testing and characterisation of MEMS/NEMS and microfluidic systems, including bulk silicon (Si) micromachining, surface micromachining, electroplating and wafer bonding.

In addition, comprehensive fabrication capabilities for optical and e-beam lithography, direct write and printing techniques, thin-film deposition, chemical vapor deposition, oxidation/doping/diffusion, lapping/polishing are available to the whole user community.

The facility provides users with the flexibility to work with many non-Si materials for quantum devices, nanophotonics, advanced electronic devices and circuits and organic electronics. Most equipment can handle samples from small pieces up to 150mm diameter samples. Technical staff members support the LNF facilities, programmes and user community by providing key expertise to help and advise researchers with their projects.


The Results

The LNF have been using a Logitech PM5 Precision Lapping & Polishing system in the research of Condensed Matter Physics by using the system to polish slides from 20 micron all the way down to 0.3 micron.