Modern electronic devices not only require increasingly stringent controls over wafer geometry in terms of flatness, specimen parallelism and thickness, but also demand a very high quality surface finish on the sample as preparation for subsequent processes.
In order to achieve this aim, Logitech has developed advanced chemical polishing equipment as a finishing process for a wide range of materials. The CP3000 and CP4000 systems achieve excellent surface polish with minimal surface and sub-surface damage to the crystal lattice structure.
The CP3000 system is a compact system designed to fit inside your existing fume extraction cabinet. The CP4000 is an integrated fume extraction system, providing a safe yet cost effective solution for aggressive chemical polishing operations.
These systems are resistant to the chemicals used in polishing processes using Bromine Methanol, Peroxide Alkaline or acid etches for example.
A summary of the features includes:
- Corrosion resistant construction from Polypropylene, PVDF and epoxy painted polyurethane.
- Adaptable deck arrangements to accommodate varying sample sizes and geometrics.
- Careful attention to safety aspects and operator convenience.
- Suitability for most types of aggressive etching agents (e.g. Bromine Methanol)
- Minimal subsurface damage
- Wide range of wafer sizes can be polished, up to 200mm (8″)
- Robust, corrosion resistant construction
- Fine etch polishing of semiconductor wafers and electro-optic crystals
- Two versions available: CP3000 and CP4000